Location History:
- Hsin-Chu, TW (2014 - 2016)
- Nantou County, TW (2016)
Company Filing History:
Years Active: 2014-2016
Title: Innovations by Inventor Fan-Wei Chang
Introduction
Fan-Wei Chang, an accomplished inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of pixel structures and fabrication methods. With a total of seven patents to his name, his work exemplifies the spirit of innovation and creativity in technology.
Latest Patents
Among his latest inventions is a novel fabrication method for pixel structures, which includes several detailed steps. The process begins with the patterning of a first metal layer to create source and drain electrodes. A semiconductor material layer is then patterned to form a channel layer alongside a pixel pattern. Subsequently, a first insulation layer is established to cover the channel layer, source electrode, drain electrode, and pixel pattern. A gate electrode is located on this first insulation layer above the channel layer. Following this, a second insulation layer is formed to encapsulate both the gate electrode and the first insulation layer. To complete the structure, a pixel opening is created in both insulation layers to expose a partial area of the pixel pattern, which is then modified to form a pixel electrode that is electrically connected to the drain electrode.
Career Highlights
Fan-Wei Chang is currently affiliated with AU Optronics Corporation, where he plays a pivotal role in advancing the company's technological capabilities. His innovative approach and commitment to research have positioned him as a leading figure in his field.
Collaborations
Throughout his career, Fan-Wei has worked alongside talented colleagues, including Hung-Che Ting and Hui-Ling Ku. These collaborations have fostered an environment of shared knowledge and creativity, furthering the impact of their collective efforts in technology.
Conclusion
In summary, Fan-Wei Chang stands out as a notable inventor whose work in pixel structure fabrication methods has contributed greatly to contemporary advancements in technology. Through his patents and collaborations, he continues to influence the future of innovation.