Sunnyvale, CA, United States of America

Erik Kim


 

Average Co-Inventor Count = 8.2

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Erik Kim

Introduction

Erik Kim is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on enhancing illumination sources and reducing thermal stress in plasma lamps.

Latest Patents

One of Erik Kim's latest patents is titled "System and method for electrodeless plasma ignition in laser-sustained plasma light source." This invention describes an illumination source designed to ignite and sustain plasma within a gas contained in a plasma lamp. The system utilizes ignition lasers and sustaining lasers to maintain the plasma effectively. Another significant patent is "Method and apparatus to reduce thermal stress by regulation and control of lamp operating temperatures." This invention features a fluid input manifold that distributes injected fluid around the bulb's body to cool it and reduce thermal stress by ensuring even heat distribution.

Career Highlights

Erik Kim is currently employed at KLA-Tencor Corporation, a leading company in the field of semiconductor manufacturing and process control. His work at the company has allowed him to develop innovative solutions that address critical challenges in plasma technology.

Collaborations

Throughout his career, Erik has collaborated with talented individuals such as Anant Chimmalgi and Rudolf C. Brunner. These collaborations have contributed to the advancement of his inventions and the overall progress in the field.

Conclusion

Erik Kim's contributions to plasma technology through his patents and work at KLA-Tencor Corporation highlight his innovative spirit and dedication to advancing the field. His inventions not only improve the functionality of plasma lamps but also address important challenges related to thermal stress.

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