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For the Inventor, By the Inventor

Kurume, Japan

Eiichi Mukai

This inventor holds 4 USPTO granted patents. Top assignees: Tokyo Electron Limited, Tokyo Electron Kyushu Limited, Tokyo Electron Saga Limited. Active years: 1994-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiichi Mukai. Retrieved from https://idiyas.com/inventor/eiichi-mukai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 100.0

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 164(Granted Patents)


Location History:

  • Kurume, JP (1994 - 1996)
  • Tosu, JP (2005)

Company Filing History:

goldMedal4 out of 10,904 
 
Tokyo Electron Limited
 patents
silverMedal2 out of 85 
 
Tokyo Electron Kyushu Limited
 patents
bronzeMedal1 out of 13 
 
Tokyo Electron Saga Limited
 patents
where one patent can have more than one assignee

Years Active: 1994-2005

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4 patents (USPTO):Explore Patents
1. 6861371 - Substrate processing system and substrate processing method (2005-03-01),
2. 5503171 - Substrates-washing apparatus (1996-04-02),
3. 5370142 - Substrate washing device (1994-12-06),
4. 5301700 - Washing system (1994-04-12),

Title: Eiichi Mukai: Innovator in Substrate Processing Technology

Introduction

Eiichi Mukai is a notable inventor based in Kurume, Japan. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His work focuses on improving the efficiency and durability of substrate processing systems.

Latest Patents

Mukai's latest patents include a substrate processing system and method designed to prevent filters from becoming clogged with foreign objects, thereby enhancing their durability. This innovative system comprises a substrate processing unit that processes substrates with a processing liquid, along with a recovery passage that includes a filter for removing contaminants. Additionally, he has developed a substrates-washing apparatus that features a process vessel for storing washing solutions, a boat for holding substrates, and a solution supply system that ensures effective cleaning.

Career Highlights

Throughout his career, Eiichi Mukai has worked with prominent companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to refine his expertise in substrate processing technologies.

Collaborations

Mukai has collaborated with notable colleagues, including Yuuji Kamikawa and Yoshiyuki Honda. Their combined efforts have contributed to advancements in the field of substrate processing.

Conclusion

Eiichi Mukai's innovative work in substrate processing technology has led to significant advancements in the industry. His patents reflect a commitment to improving the efficiency and effectiveness of substrate processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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