Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Tokyo Electron Saga Limited

Eiichi Mukai

Yuuji Kamikawa

Mitsuo Nishi

Yoshiyuki Honda

Yuji Kamikawa

Hiroshi Tanaka

Takanori Miyazaki

Yasuhiro Chouno

Shinya Murakami

Kenji Yokomizo

Kouki Kuroda

Chihaya Tashima

Naohiko Hamamura

The present invention provides a substrate processing system and method which can prevent the filter from being stuffed with foreign objects and make the filter accordingly more durable. The substrate processing systemcomprising a substrate processing unitfor processing substrates W with a processing liquid, and a processing liquid recovery passagefor passing the processing liquid discharged from the substrate processing unit, in which the processing liquid recovery passageincludes a filterfor removing foreign objects mixed in the processing liquid, a cleaning fluid supply passagefor feeding a cleaning fluid for cleaning the filter, and a discharge passagefor discharging the processing liquid and the cleaning fluid from the filter

Substrate processing system and substrate processing method

A substrates-washing apparatus includes a process vessel in which washing solution is stored to wash a plurality of substrates, a boat for holding the substrates parallel to one another in the process vessel, solution supply openings formed in the bottom of the process vessel, a solution supply system communicated with the solution supply openings to supply washing solution into the process vessel through the solution supply openings, and a straightening plate arranged between the substrates held on the boat and the solution supply openings in the bottom of the process vessel and provided with a plurality of apertures through which washing solution passes. The apertures form plural lines in the longitudinal direction of the straightening plate, the apertures in each line are arranged to correspond to the substrates alternately, and the apertures in one line are shifted from those in the other adjacent line.

Substrates-washing apparatus

A substrates-cleaning apparatus comprising process vessels in which washing solutions are contained, a chuck mechanism having a first substrate holder section for carrying silicon wafers to the process vessels while holding them in it, and a boat mechanism having a second substrate holder section for receiving the wafers from the chuck mechanism and for supporting the wafers in the washing solutions, wherein said second substrate holder section comprises base members made of erosion and heat resistant material, and receiver members attached to the base members, having a plurality of substrate holding grooves thereon, and made of erosion and heat resistant synthetic resin substantially same in softness as or softer than the wafers.

Substrate washing device

A washing system comprising a wafer washing section having plural chemical washing vessels, plural water washing vessels and a drier, a cassette washing section having a water washing device and a drier, a loader section for taking out the wafers from the cassettes and loading the wafers into the wafer washing section, an unloader section for returning the washed wafers in the washed cassette and unloading the wafers from the wafer washing section, a wafer transfer device the wafers in the wafer washing section, a cassette lifter for carrying the cassettes from the loader section to the cassette washing section, and a wire drive unit for carrying the cassettes in the cassette washing section.

Washing system

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Kurume, Japan

Eiichi Mukai