Company Filing History:
Years Active: 2013-2015
Title: Durron Andre Hutt: Innovator in Chemical Mechanical Polishing Technologies
Introduction
Durron Andre Hutt is a prominent inventor based in Wilmington, DE, USA, recognized for his contributions to the field of chemical mechanical polishing. With a total of four patents to his name, he has significantly impacted the manufacturing processes of polishing layers utilized in various electronic applications.
Latest Patents
Among his latest achievements, Hutt has developed a method of manufacturing grooved chemical mechanical polishing layers. This innovative technique minimizes the formation of defects in the polishing layers, enhancing the efficiency and reliability of chemical mechanical polishing pads. Another notable patent involves a method for producing polishing layers with an integral window, derived from a cake. This method also addresses the reduction of density defects and surface roughness in the manufactured layers, further refining the polishing technology.
Career Highlights
Durron Andre Hutt currently works with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he engages in advanced research and development of electronic materials. His expertise and innovative spirit have propelled the company’s technological advancements in the electronic materials sector.
Collaborations
Throughout his career, Hutt has collaborated with esteemed colleagues, including Kathleen McHugh and James T. Murnane. These partnerships reflect a commitment to teamwork and shared innovation, contributing to the success of various projects within the company.
Conclusion
Durron Andre Hutt exemplifies the essence of innovation within the domain of chemical mechanical polishing. His patents not only solve existing challenges in the industry but also pave the way for future advancements. Through his work, he continues to inspire aspiring inventors and contribute to the evolution of electronic material technologies.