The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Mar. 22, 2012
Brian T. Cantrell, Port Deposit, MD (US);
Kathleen Mchugh, Newark, DE (US);
James T. Murnane, Norristown, PA (US);
George H. Mcclain, Middletown, DE (US);
Durron A. Hutt, Wilmington, DE (US);
Robert A. Brady, Coatesville, PA (US);
Christopher A. Young, Newark, DE (US);
Jeffrey Borcherdt Miller, West Chester, PA (US);
Brian T. Cantrell, Port Deposit, MD (US);
Kathleen McHugh, Newark, DE (US);
James T. Murnane, Norristown, PA (US);
George H. McClain, Middletown, DE (US);
Durron A. Hutt, Wilmington, DE (US);
Robert A. Brady, Coatesville, PA (US);
Christopher A. Young, Newark, DE (US);
Jeffrey Borcherdt Miller, West Chester, PA (US);
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Abstract
A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.