The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Sep. 27, 2012
Applicant:
Rohm and Haas Electronic Materials Cmp Holdings, Inc., Newark, DE (US);
Inventors:
Jeffrey James Hendron, Elkton, MD (US);
Kenneth Vavala, Middletown, DE (US);
Jeffrey Borcherdt Miller, West Chester, PA (US);
Brian T. Cantrell, Port Deposit, MD (US);
James T. Murnane, Norristown, PA (US);
Kathleen McHugh, Newark, DE (US);
George H. McClain, Middletown, DE (US);
Durron A. Hutt, Wilmington, DE (US);
Robert A. Brady, Coatesville, PA (US);
Christopher A. Young, Newark, DE (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24D 11/00 (2006.01); B24B 37/26 (2012.01); B24D 18/00 (2006.01);
U.S. Cl.
CPC ...
B24B 37/26 (2013.01); B24D 18/00 (2013.01); B24D 18/0009 (2013.01);
Abstract
A method of manufacturing grooved polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of defects in the polishing layers are minimized.