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For the Inventor, By the Inventor

Pleasanton, CA, United States of America

Dongqing Yang

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This inventor holds 23 USPTO granted patents and 7 published patent applications, primarily in Semiconductor Processing. Top assignee: Applied Materials, Inc.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dongqing Yang. Retrieved from https://idiyas.com/inventor/dongqing-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 95.7

Average Co-Inventor Count = 4.1

ph-index = 9

Forward Citations = 1,290(Granted Patents)


Location History:

  • Pleasonton, CA (US) (2018)
  • Pleasanton, CA (US) (2017 - 2022)
  • San Jose, CA (US) (2013 - 2024)

Company Filing History:

goldMedal23 out of 14,433 
 
Applied Materials, Inc.
 patents

Years Active: 2013-2026

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Areas of Expertise:
Selective Etching
Oxide Removal
Chamber Optimization
Silicon Oxide
Plasma Etch
Multi-Zone Substrates
Process Window Widening
Ion-Damaged Spacers
Dry-Etch Techniques
Leakage Current Reduction
High-Temperature Etch
Stable Processing
23 patents (USPTO):Explore Patents
1. 12713853 - OXIDE QUALITY DIFFERENTIATION (2026-08-18),
2. 12315736 - Methods of highly selective silicon oxide removal (2025-05-27),
3. 11915950 - Multi-zone semiconductor substrate supports (2024-02-27),
4. 11515179 - Semiconductor processing chamber multistage mixing apparatus (2022-11-29),
5. 11417534 - Selective material removal (2022-08-16),
6. 11361939 - Semiconductor processing chamber for multiple precursor flow (2022-06-14),
7. 11276590 - Multi-zone semiconductor substrate supports (2022-03-15),
8. 11276559 - Semiconductor processing chamber for multiple precursor flow (2022-03-15),
9. 11164724 - Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing (2021-11-02),
10. 11101136 - Process window widening using coated parts in plasma etch processes (2021-08-24),
11. 10964512 - Semiconductor processing chamber multistage mixing apparatus and methods (2021-03-30),
12. 10699921 - Semiconductor processing chamber multistage mixing apparatus (2020-06-30),
13. 10679870 - Semiconductor processing chamber multistage mixing apparatus (2020-06-09),
14. 10297458 - Process window widening using coated parts in plasma etch processes (2019-05-21),
15. 10134581 - Methods and apparatus for selective dry etch (2018-11-20),

Title: Innovations by Dongqing Yang in Semiconductor Technology

Introduction: Dongqing Yang, based in Pleasanton, CA, is a notable inventor with a remarkable portfolio of 21 patents. His contributions significantly impact the semiconductor industry, driving advancements in technology and materials processing.

Latest Patents: Among his latest inventions, Dongqing holds patents for innovative technologies such as the "Multi-zone semiconductor substrate supports." This invention encompasses exemplary support assemblies that include a top puck and a backing plate, designed to enhance cooling and heating capabilities within semiconductor processing. Additionally, his patent on "Semiconductor processing chamber multistage mixing apparatus" presents a sophisticated system integrating a mixing manifold and a remote plasma unit, optimizing performance in semiconductor processing chambers.

Career Highlights: Dongqing Yang is currently affiliated with Applied Materials, Inc., a leading company in the semiconductor equipment and materials industry. His work focuses on developing cutting-edge technologies that streamline semiconductor fabrication processes and improve overall efficiency.

Collaborations: Throughout his career, Dongqing has collaborated with esteemed colleagues, including Dmitry Lubomirsky and Peter Hillman. Their collective efforts enhance innovations in semiconductor technologies and accelerate the pace of discoveries and developments in the field.

Conclusion: Dongqing Yang's innovative spirit and expertise in semiconductor technology are evident through his extensive patent portfolio. His ongoing work at Applied Materials, Inc. and collaborations with fellow experts continue to shape the future of semiconductor processing, exemplifying the critical role of inventors in advancing technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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