Dongjiang Wang

Title: The Innovative Contributions of Dongjiang Wang

Introduction

Dongjiang Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on advanced fabrication methods that enhance the performance and efficiency of semiconductor structures.

Latest Patents

One of his latest patents is titled "Semiconductor structures and fabrication method thereof." This method involves several steps, including providing a to-be-etched layer and forming a hard mask layer on it. The process also includes creating a photoresist layer and forming a patterned photoresist layer with openings that expose the hard mask layer. Additionally, sidewall spacers are formed on the openings, and a patterned hard mask layer is created by etching the hard mask layer using the patterned photoresist layer and sidewall spacers as an etching mask. This innovative method results in patterns in the hard mask layer that have a substantially right angle at the edge.

Another notable patent is for "Local interconnect structure and fabrication method." This patent describes a process where a dielectric layer is formed on a semiconductor substrate. A first film layer is patterned on the dielectric layer to define a region for a local interconnect structure. The method includes forming and patterning a sidewall spacer surrounding the first film layer and etching the dielectric layer to create openings that are filled with conductive material to form the local interconnect structure.

Career Highlights

Dongjiang Wang has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Dongjiang has collaborated with notable professionals in the field, including Haiyang Zhang and Steven Y Zhang. These collaborations have further enriched his work and led to innovative solutions in semiconductor fabrication.

Conclusion

Dongjiang Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor fabrication methods, showcasing the importance of innovation in technology.