Dong-Woon Park

Title: Innovations of Dong-Woon Park in Semiconductor Technology

Introduction

Dong-Woon Park is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of Dong-Woon Park's latest patents involves overlay marks, methods of forming the same, and methods of fabricating semiconductor devices using these techniques. In this method, a substrate that includes both a circuit area and an overlay mark area is utilized. Conductive gate patterns are formed on the substrate in the circuit area, ensuring that the overlay mark area remains free of gate patterns. Additionally, conductive contact patterns are created on the substrate between the gate patterns in the circuit area. A mirror pattern is then established in the overlay mark area, where both the mirror pattern and the contact patterns consist of the same reflective material. This innovation also discusses related semiconductor devices, overlay marks, and fabrication methods.

Career Highlights

Dong-Woon Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to the advancement of electronic devices.

Collaborations

Throughout his career, Dong-Woon Park has collaborated with notable colleagues, including Yong-Kug Bae and Jong-Su Kim. These collaborations have further enhanced his research and development efforts in the semiconductor field.

Conclusion

Dong-Woon Park's innovative work in semiconductor technology has led to significant advancements in the industry. His contributions, particularly in the area of overlay marks and fabrication methods, continue to influence the development of modern electronic devices.