The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Dec. 14, 2010
Dong-woon Park, Seoul, KR;
Woo-sung Han, Seongnam-si, KR;
Seong-woon Choi, Suwon-si, KR;
Jeong-ho Yeo, Suwon-si, KR;
Dong-woon Park, Seoul, KR;
Woo-sung Han, Seongnam-si, KR;
Seong-woon Choi, Suwon-si, KR;
Jeong-ho Yeo, Suwon-si, KR;
Samsung Electronics Co., Ltd., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
Abstract
Methods and apparatus are disclosed that arrange mask patterns in response to the contribution of a second pattern to image intensity. In some methods of arranging mask patterns, a distribution of functions h(ξ−x) is obtained which represents the contribution of a second pattern to image intensity on a first pattern. Neighboring regions of the first pattern are discretized into finite regions, and the distribution of the functions h(ξ−x) is replaced with representative values(x,ξ) of the discretized regions. A position of the second pattern is determined using polygonal regions having the same(x,ξ). As described, the term x is the position of the first pattern and the term ξ is the position of the assist.