The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Aug. 30, 2011
Applicants:

Dong-woon Park, Seoul, KR;

Hyun-jong Lee, Hwaseong-si, KR;

Si-young Choi, Seongnam-si, KR;

Yong-kug Bae, Hwaseong-si, KR;

Inventors:

Dong-woon Park, Seoul, KR;

Hyun-jong Lee, Hwaseong-si, KR;

Si-young Choi, Seongnam-si, KR;

Yong-kug Bae, Hwaseong-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); G06F 17/5081 (2013.01); G03F 1/70 (2013.01); Y10S 438/947 (2013.01);
Abstract

A method of forming a pattern includes forming a plurality of target patterns, forming a plurality of pitch violating patterns that make contact with the plurality of target patterns and are disposed between the plurality of target patterns, classifying the plurality of pitch violating patterns into a first region and a second region adjacent to the first region, and forming an initial pattern corresponding to one of the first region and the second region.


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