Hwaseong, South Korea

Dong-Won Jung

This inventor holds 8 USPTO granted patents. Top assignee: Auros Technology, Inc.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong-Won Jung. Retrieved from https://idiyas.com/inventor/dong-won-jung-svaf251k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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8 patents (USPTO):Explore Patents

Title: Innovations of Dong-Won Jung

Introduction

Dong-Won Jung is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of overlay measurement technology, holding a total of seven patents. His work focuses on enhancing the precision of measurements in semiconductor manufacturing.

Latest Patents

Among his latest patents is an overlay measurement device and method designed to measure errors between overlay marks on different layers of a wafer. This device includes a light source, an objective lens, a lens focus actuator, an auto focus module, a detector, a transmission and receipt part, and a processor. Another notable patent is also an overlay measurement device that utilizes an aperture to modify the beam from the light source for optimal imaging of the overlay marks.

Career Highlights

Dong-Won Jung is currently employed at Auros Technology, Inc., where he continues to innovate in the field of measurement devices. His expertise in overlay measurement has positioned him as a key figure in advancing semiconductor technology.

Collaborations

He has collaborated with notable coworkers such as Sol-Lee Hwang and Hee-Chul Lim, contributing to various projects that enhance the capabilities of measurement technologies.

Conclusion

Dong-Won Jung's contributions to overlay measurement technology reflect his dedication to innovation and precision in the semiconductor industry. His patents and work at Auros Technology, Inc. continue to influence advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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