Hwaseong, South Korea

Dong Gun Lee

This inventor holds 24 USPTO granted patents and 9 published patent applications, primarily in EUV Lithography. Top assignees: Samsung Electronics Co., Ltd., Esol Inc.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Gun Lee. Retrieved from https://idiyas.com/inventor/dong-gun-lee-7sc41bn4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 95.8

Average Co-Inventor Count = 1.9

ph-index = 5

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 2016-2026

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Areas of Expertise:
EUV Microscope
Free Form Illumination
EUV Light Source
Plasma Gas Recycling
Mask Inspection
Multilayer Reflection
EUV Lithography
Light Emitting Device
Nanostructure Semiconductor
Reflectivity Measurement
Chip Mounting
Display Device
24 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Dong Gun Lee in EUV Technology

Introduction: Dong Gun Lee, a prominent inventor based in Hwaseong-si, South Korea, has made significant contributions to the field of extreme ultraviolet (EUV) technology. With a remarkable portfolio of 20 patents, he has played a vital role in advancing the capabilities of EUV light sources and inspection devices.

Latest Patents: Among his latest innovations, Dong Gun Lee has developed two notable patents. The first is an EUV light source device designed for generating EUV light through plasma reactions. This innovative device incorporates a focusing lens to focus a laser beam from a laser source, a vacuum chamber to create the necessary environment, and a gas jet nozzle that supplies plasma reaction gas to achieve the desired EUV light output.

The second patent is for an EUV mask inspection device utilizing a multilayer reflection zone plate. This device features an EUV light source that outputs light with wavelengths ranging from 5 nm to 15 nm, along with a zone plate pattern that enhances imaging capabilities. This inspection device further includes an aperture for monochromatic light provision and an image sensor for accurately measuring light intensity through the EUV mask.

Career Highlights: Dong Gun Lee's career includes significant tenures at leading companies in technology. He has worked with Samsung Electronics Co., Ltd., where he likely honed his skills in innovative technology, and Esol Inc., where he further contributed to developments in the field.

Collaborations: Throughout his career, Dong has collaborated with several talented professionals, including Yong Il Kim and Jin Sub Lee. These collaborations have likely led to fruitful exchanges of ideas and advancements in research and development.

Conclusion: Dong Gun Lee's passion for innovation and his extensive patent portfolio underscore his impact on the field of EUV technology. His contributions not only enhance the functionality of devices but also push the boundaries of what is possible in modern technology. As he continues his work, the industry looks forward to further advancements that will stem from his creative vision and expertise.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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