The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Jan. 14, 2023
Applicant:

Esol Inc., Hwaseong-si, KR;

Inventor:

Dong Gun Lee, Hwaseong-si, KR;

Assignee:

ESOL Inc., Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2005.12); G02B 21/00 (2005.12); G02B 21/36 (2005.12); G03F 7/00 (2005.12);
U.S. Cl.
CPC ...
G02B 21/0048 (2012.12); G02B 21/0032 (2012.12); G02B 21/36 (2012.12); G03F 7/70133 (2012.12);
Abstract

A high performance EUV microscope device with a freeform illumination system having an elliptical mirror, includes: an EUV source for outputting EUV light; a spherical mirror having a two-axis driving unit which receives and reflects the EUV light output from the EUV light source and controls a reflection direction of the incident light through two-axis angle scanning; an optical path changing means for receiving the reflected light reflected from the spherical mirror and providing illumination light to a target object to be measured; a zone plate lens for focusing the light reflected after entering the target object; and a photodetector for receiving the light focused by the zone plate lens, wherein the spherical mirror is rotated by the driving unit to control the reflection direction of the reflected light, and the illumination light irradiated to the target object is controlled by the optical path changing means receiving the reflected light.


Find Patent Forward Citations

Loading…