The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

May. 26, 2023
Applicant:

Esol, Inc., Hwaseong-si, KR;

Inventor:

Dong Gun Lee, Hwaseong-si, KR;

Assignee:

ESOL, Inc., Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G03F 7/70033 (2013.01); G03F 7/70983 (2013.01); G01N 2021/95676 (2013.01);
Abstract

A high-performance EUV microscope with a free form illumination system, includes: an EUV light source that outputs EUV light; one spherical mirror, which receives and reflects the EUV light outputted from the EUV light source and includes a two-axis drive part for controlling reflection direction of incident light through two-axis angle scan; one plane mirror, which receives the reflected light reflected from the spherical mirror and provides illumination light to a measurement target, and in which a plurality of mirror cells are arranged at each angle; a zone plate lens for focusing measurement light, which is the illumination light formed through the plane mirror and incident on the measurement target and then reflected; and a photodetector for receiving the measurement light focused by the zone plate lens, wherein a reflection angle of the spherical mirror and a reflection angle of the plane mirror are selectively controlled, respectively.


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