Farmington, MN, United States of America

Don Rankila

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2017-2022

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6 patents (USPTO):Explore Patents

Title: Don Rankila: Innovator in Semiconductor Technology

Introduction

Don Rankila is a notable inventor based in Farmington, MN (US), recognized for his contributions to semiconductor technology. With a total of six patents to his name, Rankila has made significant advancements in the field, particularly in high-voltage MOSFET structures and trench semiconductor device layouts.

Latest Patents

Among his latest patents, Rankila has developed a trench semiconductor device layout configuration. This innovation includes a layer of semiconductor material with both exterior and interior trench patterns, enhancing the device's performance. The exterior trench pattern is lined with dielectric material and filled with conductive material, while the interior trench pattern is similarly constructed. Another significant patent involves high-voltage MOSFET structures, which feature a bond-pad structure designed to minimize pad-substrate capacitance. This design incorporates upper and lower polysilicon plates, improving the efficiency of high-voltage MOSFETs.

Career Highlights

Throughout his career, Don Rankila has worked with prominent companies in the semiconductor industry, including Polar Semiconductor, Inc. and Sanken Electric Co., Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Rankila has collaborated with notable professionals in the field, including Peter West and Tatsuya Kamimura. These partnerships have likely fostered a creative environment that has led to the development of his patented technologies.

Conclusion

Don Rankila's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field, paving the way for future innovations.

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