Deyun Wang

Title: Innovator Deyun Wang: Advancements in Semiconductor Cleaning Technology

Introduction

Deyun Wang, an accomplished inventor based in Shanghai, China, has made significant contributions to the field of semiconductor manufacturing. With a total of two patents to his name, Deyun is recognized for his innovative approaches to cleaning processes that enhance efficiency and effectiveness in the industry.

Latest Patents

Deyun Wang's recent patents focus on sophisticated methods and apparatuses for removing particles and photoresist from substrates. His first patent outlines a comprehensive method involving the transfer of substrates into a DIObath, followed by a process in an SPM bath. This unique combination effectively removes particles and photoresist, particularly those treated with medium or high doses of ion implantation.

The second patent introduces an apparatus designed to clean semiconductor wafers. This innovative system includes multiple tanks and robotic automation for efficient transfer and processing of wafers, ensuring thorough cleaning and drying stages.

Career Highlights

Currently, Deyun Wang is associated with ACM Research (Shanghai) Inc., a company known for its cutting-edge technologies in semiconductor cleaning solutions. His expertise and solutions contribute to advancing the efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Deyun has worked alongside talented individuals such as Hui Wang and Fuping Chen. These collaborations have fostered a productive environment for innovation and the development of advanced cleaning technologies.

Conclusion

Deyun Wang's innovations and patents reflect a commitment to overcoming challenges in semiconductor manufacturing. His contributions not only enhance the cleaning process but also represent a significant step forward in sustainable and efficient semiconductor production. As the industry continues to evolve, inventors like Deyun play a crucial role in driving progress.