The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Aug. 09, 2021
Acm Research (Shanghai), Inc., Shanghai, CN;
Hui Wang, Shanghai, CN;
Shena Jia, Shanghai, CN;
Xiaofeng Tao, Shanghai, CN;
Bin He, Beijing, CN;
Xin Zhao, Shanghai, CN;
Yingnan Sun, Shanghai, CN;
Bin Li, Shanghai, CN;
Jun Wang, Shanghai, CN;
Jian Wang, Shanghai, CN;
Fuping Chen, Shanghai, CN;
Xiaoyan Zhang, Shanghai, CN;
Zhenming Chu, Shanghai, CN;
Deyun Wang, Shanghai, CN;
ACM RESEARCH (SHANGHAI), INC., Shanghai, CN;
Abstract
A drying apparatus is based on supercritical fluid. The drying apparatus includes: an upper cover; a base, arranged below the upper cover and the base and the upper cover; a substrate tray, arranged on the base; a first fluid supply tube, arranged on the top wall of the upper cover; a fluid disturbance plate, arranged below the first fluid supply tube; a second fluid supply tube, arranged on a first side wall of the upper cover; and a fluid discharge tube, arranged on a second side wall of the upper cover. The inner space of the closed chamber can be minimized by using the drying apparatus, thereby saving the usage amount of the supercritical fluid, and reducing the usage costs.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile