Company Filing History:
Years Active: 2020-2026
Title: Zhenming Chu: Innovator in Substrate Cleaning Technology
Introduction
Zhenming Chu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of substrate cleaning technology, holding 3 patents that showcase his innovative approach to enhancing cleaning processes for semiconductor devices.
Latest Patents
One of Zhenming Chu's latest patents is a substrate cleaning apparatus. This apparatus includes a chuck assembly, at least one first nozzle, and an ultra or mega sonic device. The chuck assembly is designed to receive and clamp a substrate, while the nozzle sprays liquid onto the substrate's top surface. The ultra or mega sonic device is positioned above the substrate to provide effective cleaning. A continuous gap filled with liquid ensures that the cleaning process is efficient and thorough.
Another notable patent is a fall-proof apparatus for cleaning semiconductor devices. This apparatus features a nozzle connected to a carrier and a megasonic/ultrasonic device fixed on the carrier. A sensor detects the distance between the megasonic/ultrasonic device and the carrier, ensuring that the device remains secure during operation. This innovative design enhances safety and reliability in cleaning processes.
Career Highlights
Zhenming Chu is currently employed at Acm Research (Shanghai) Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His work focuses on improving cleaning methods that are essential for maintaining the quality and performance of semiconductor devices.
Collaborations
Zhenming has collaborated with talented coworkers, including Hui Wang and Jun Wu, who contribute to the innovative environment at Acm Research.
Conclusion
Zhenming Chu's contributions to substrate cleaning technology reflect his dedication to innovation and excellence. His patents demonstrate a commitment to enhancing the efficiency and safety of cleaning processes in the semiconductor industry.