The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2022

Filed:

Mar. 30, 2017
Applicant:

Acm Research (Shanghai) Inc., Shanghai, CN;

Inventors:

Hui Wang, Shanghai, CN;

Jun Wu, Shanghai, CN;

Cheng Cheng, Shanghai, CN;

Xi Wang, Shanghai, CN;

Zhenming Chu, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/12 (2006.01); H01L 21/67 (2006.01); G03F 1/82 (2012.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B08B 3/12 (2013.01); G03F 1/82 (2013.01); H01L 21/67051 (2013.01); H01L 21/68728 (2013.01);
Abstract

A substrate cleaning apparatus, including a chuck assembly, at least one first nozzle (), and an ultra or mega sonic device (). The chuck assembly is configured to receive and clamp a substrate. The at least one first nozzle () is configured to spray liquid onto the top surface of the substrate. The ultra or mega sonic device () is configured to dispose above the top surface of the substrate for providing an ultra or mega sonic cleaning to the substrate. A gap is formed between the ultra or mega sonic device () and the top surface of the substrate, and the gap is fully and continuously filled with the liquid so that the entire underneath of the ultra or mega sonic device () is filled with the liquid all the time during the cleaning process.


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