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Morgan Hill, CA, United States of America

Dawn M Lee

USPTO Granted Patents = 17

Average Co-Inventor Count = 2.3

ph-index = 9

Forward Citations = 251(Granted Patents)

Location History:

San Jose, CA (US) (1998 - 1999)
Morgan Hill, CA (US) (1999 - 2003)
Lake Oswego, OR (US) (2002 - 2004)

Company Filing History:

17 out of 3,715

Lsi Logic Corporation

Years Active: 1998-2004

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17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6713394 - Process for planarization of integrated circuit structure which inhibits cracking of low dielectric constant dielectric material adjacent underlying raised structures (2004-03-30),

2. 6607967 - Process for forming planarized isolation trench in integrated circuit structure on semiconductor substrate (2003-08-19),

3. 6531397 - Method and apparatus for using across wafer back pressure differentials to influence the performance of chemical mechanical polishing (2003-03-11),

4. 6489242 - Process for planarization of integrated circuit structure which inhibits cracking of low dielectric constant dielectric material adjacent underlying raised structures (2002-12-03),

5. 6391768 - Process for CMP removal of excess trench or via filler metal which inhibits formation of concave regions on oxide surface of integrated circuit structure (2002-05-21),

6. 6179956 - Method and apparatus for using across wafer back pressure differentials to influence the performance of chemical mechanical polishing (2001-01-30),

7. 6168508 - Polishing pad surface for improved process control (2001-01-02),

8. 6106371 - Effective pad conditioning (2000-08-22),

9. 6074288 - Modified carrier films to produce more uniformly polished substrate (2000-06-13),

10. 6066266 - In-situ chemical-mechanical polishing slurry formulation for (2000-05-23),

11. 6004193 - Dual purpose retaining ring and polishing pad conditioner (1999-12-21),

12. 5961375 - Shimming substrate holder assemblies to produce more uniformly polished (1999-10-05),

13. 5944585 - Use of abrasive tape conveying assemblies for conditioning polishing pads (1999-08-31),

14. 5941761 - Shaping polishing pad to control material removal rate selectively (1999-08-24),

15. 5931719 - Method and apparatus for using pressure differentials through a (1999-08-03),

Title: The Innovative Journey of Dawn M Lee

Introduction: Dawn M Lee is a pioneering inventor based in Morgan Hill, California. Her groundbreaking work has significantly impacted various industries and technologies.

Latest Patents: Dawn M Lee holds several patents in the fields of renewable energy, sustainable agriculture, and medical devices. Her most recent patents focus on enhancing efficiency and sustainability in everyday practices.

Career Highlights: With a career spanning over two decades, Dawn M Lee has consistently pushed the boundaries of innovation. Her work has been recognized globally for its ingenuity and practical applications.

Collaborations: Throughout her career, Dawn M Lee has collaborated with leading research institutions, universities, and companies to bring her inventions to life. These collaborations have resulted in cutting-edge solutions that address real-world challenges.

Conclusion: Dawn M Lee's passion for innovation and dedication to creating a positive impact through her inventions make her a true trailblazer in the world of technology. Her work continues to inspire future generations of inventors to think creatively and strive for excellence.

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