David S Pan

Title: The Innovative Contributions of David S Pan

Introduction

David S Pan is a notable inventor based in Doylestown, PA (US), recognized for his significant contributions to the field of integrated circuits and pattern recognition systems. With a total of nine patents to his name, Pan has demonstrated a commitment to advancing technology through innovative solutions.

Latest Patents

Among his latest patents is the "Pattern Recognition Alignment System," which discloses a substrate alignment and exposure system. This system captures an image of the substrate using a pattern recognition system, determining the offset from the alignment and adjusting the substrate relative to the reticle for precise alignment. The invention utilizes two optical alignment systems to ensure accurate positioning, allowing for the recognition of various features on the reticle and substrate. Another significant patent is the "Method of Making Integrated Circuit with High Current Transistor." This method involves forming patches of a silicon nitride mask to create high-current vertical DMOS and NPN transistors, leading to improved conductivity and manufacturing efficiency.

Career Highlights

David S Pan has worked with reputable companies such as Solid State Scientific Corporation and Sprague Electric Company. His experience in these organizations has contributed to his expertise in the field of electronics and semiconductor technology.

Collaborations

Throughout his career, Pan has collaborated with notable individuals, including Alexander H Owens and Mark A Halfacre. These partnerships have likely enriched his work and led to further advancements in his projects.

Conclusion

David S Pan's innovative patents and career achievements highlight his significant role in the advancement of technology in integrated circuits and pattern recognition systems. His contributions continue to influence the field and inspire future innovations.