Company Filing History:
Years Active: 2001-2008
Title: The Innovative Contributions of David John Lockwood
Introduction
David John Lockwood, an esteemed inventor located in Vanier, CA, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 6 patents, Lockwood's work primarily focuses on the stabilization and enhancement of porous silicon structures.
Latest Patents
Among his notable innovations, Lockwood's latest patents include:
1. **Passivation of Porous Semiconductors** - This patent discloses a groundbreaking method for stabilizing porous silicon by subjecting a porous silicon structure, terminated with hydrogen atoms, to organic thermal processing. This process substitutes the hydrogen atoms with a protective organic layer, resulting in structures with unprecedented stability.
2. **Luminescence Stabilization of Anodically Oxidized Porous Silicon Layers** - In this invention, a porous silicon structure is stabilized through anodic oxidation followed by chemical functionalization. This process protects non-oxidized surface regions, particularly using 1-decene under thermal conditions, to create a durable protective organic monolayer, ensuring high stability.
Career Highlights
Lockwood is affiliated with the National Research Council of Canada, where he has been instrumental in advancing research on porous silicon technologies. His innovative approaches have set new standards in the industry, particularly in stability enhancement of semiconductor materials.
Collaborations
Throughout his career, David John Lockwood has collaborated with esteemed colleagues, including Rabah Boukherroub and Danial D M Wayner. Their joint efforts have significantly contributed to the development of stable porous silicon structures and related applications.
Conclusion
David John Lockwood's contributions to the field of porous silicon and semiconductor technology underscore his role as a leading inventor in this domain. His innovative patents reflect a commitment to advancing materials science and are poised to impact various technological applications in the future.
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