Inventors with similar research interests:
Location History:
- Hopewell Juction, NY (US) (1998)
- Hopewell Jct., NY (US) (1998 - 2000)
- Hopewell Junction, NY (US) (1992 - 2004)
- Orono, ME (US) (2001 - 2004)
Company Filing History:
Years Active: 1992-2004
Title: The Innovative Work of David Edward Kotecki in Semiconductor Fabrication
Introduction:
David Edward Kotecki is a prolific inventor based in Hopewell Junction, NY, with an impressive portfolio of 60 patents in the field of semiconductor devices and fabrication techniques. His groundbreaking contributions have significantly advanced the technology landscape, particularly in the area of contact plug formation and dual-diameter electrical conductors.
Latest Patents:
1. "Contact Plug Formation for Devices with Stacked Capacitors": This patent describes methods for fabricating a semiconductor device with parallel gate structures on a substrate, utilizing a blanket depositing of conductive material to fill spaces and cover the gate structures. The innovative technique enables efficient contact formation over active areas, enhancing device performance.
2. "Method for Fabricating a Dual-Diameter Electrical Conductor": This patent introduces a multi-diameter electrical conductor for use as an embedded plug in microelectronic devices. The conductor comprises a body portion with a first diameter and at least one neck portion with a smaller second diameter. This design facilitates electrical communication between electrodes and active circuit elements in semiconductor structures, contributing to enhanced functionality.
Career Highlights:
David Edward Kotecki has made significant contributions in semiconductor fabrication during his tenure at prominent companies like IBM. His expertise and inventive spirit have driven advancements in device manufacturing processes, paving the way for more efficient and reliable semiconductor devices.
Collaborations:
Throughout his career, Kotecki has collaborated with esteemed professionals in the field, including Katherine Lynn Saenger and William H Ma. These collaborations have led to the development of novel technologies and solutions that have had a lasting impact on the industry.
Conclusion:
David Edward Kotecki's innovative work in semiconductor fabrication has left an indelible mark on the technological landscape. His numerous patents and collaborations reflect his dedication to advancing the field and pushing the boundaries of what is possible in semiconductor device manufacturing. Kotecki's contributions continue to inspire future generations of inventors and engineers in the pursuit of technological innovation.
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