Location History:
- Vichy, MO (US) (2011 - 2016)
- Rolla, MO (US) (2014 - 2018)
Company Filing History:
Years Active: 2011-2018
Title: The Innovative Contributions of Daniel M. Sullivan
Introduction
Daniel M. Sullivan is a notable inventor based in Vichy, Missouri, who has made significant contributions to the field of lithography. With a total of 8 patents to his name, Sullivan's work focuses on developing advanced materials and processes that enhance the efficiency and effectiveness of photolithography.
Latest Patents
Sullivan's latest patents include innovative spin-on carbon compositions for lithographic processing. This invention is directed towards spin-on carbon materials comprising polyamic acid compositions and a crosslinker in a solvent system. These materials are particularly useful in trilayer photolithography processes. The films created with these compositions are resistant to solvents commonly used in lithographic materials, such as PGME, PGMEA, and cyclohexanone. However, they can be dissolved in developers typically used in photolithography. Additionally, the films can be heated at high temperatures to enhance thermal stability for high-temperature processing. Notably, the material exhibits wiggling resistance during pattern transfer to silicon substrates using fluorocarbon etch.
Another significant patent involves non-covalently crosslinkable materials for photolithography processes. This invention describes compositions and methods for using non-covalently crosslinked resin coatings in lithographic applications. These materials are designed to undergo a change after coating that provides solvent resistance and, in some cases, simultaneous aqueous-base solubility. The non-covalent interactions allow for easier removal of these coatings compared to covalently crosslinked materials. These materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
Career Highlights
Sullivan's career is marked by his role at Brewer Science, Inc., where he has been instrumental in advancing lithographic technologies. His innovative approach and dedication to research have positioned him as a key figure in the field.
Collaborations
Throughout his career, Sullivan has collaborated with talented individuals such as Yubao Wang and Qin Lin. These partnerships have contributed to the development of cutting-edge technologies in lithography.
Conclusion
Daniel M. Sullivan's contributions to the field of lithography through his innovative patents and collaborative efforts highlight his importance as an inventor. His work continues to influence advancements in photolithography processes and materials.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.