The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Jan. 31, 2011
Qin Lin, Rolla, MO (US);
Daniel M. Sullivan, Vichy, MO (US);
Hao Xu, Carnas, WA (US);
Tony D. Flaim, St. James, MO (US);
Qin Lin, Rolla, MO (US);
Daniel M. Sullivan, Vichy, MO (US);
Hao Xu, Carnas, WA (US);
Tony D. Flaim, St. James, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating the tops of the features. As a result, a patterned imaging layer can be removed using solvent, blanket exposure followed by developer washing, or dry etching directly, without an etch-back process, and the original bright field lithography pattern can be reversed into dark field features, and transferred into subsequent layers using the nanoparticle reversal material as an etch mask.