Hao Xu

Title: The Innovations of Inventor Hao Xu from Rolla, MO

Introduction: Hao Xu is a distinguished inventor based in Rolla, Missouri, known for his significant contributions to the field of lithography. With a total of six patents to his name, he has demonstrated exceptional creativity and technical prowess in developing novel approaches to enhance lithographic processes. His work has greatly influenced advancements in manufacturing and materials science.

Latest Patents: Among Hao Xu's latest patents are:

1. **Reversal Lithography Approach by Selective Deposition of Nanoparticles** - This innovative process introduces a novel reversal lithography technique that eliminates the need for etch-back processes. The method involves selectively depositing nanoparticles into the gaps between features, allowing for the removal of a patterned imaging layer via solvent, blanket exposure, followed by developer washing, or dry etching directly. This approach enables the transformation of a bright field lithography pattern into dark field features and facilitates the transfer of patterns into subsequent layers using the nanoparticle reversal material as an etch mask.

2. **On-Track Process for Patterning Hardmask by Multiple Dark Field Exposures** - This patent details methods for creating via or trench structures on a developer-soluble hardmask layer through multiple exposure-development processes. As the hardmask layer is patterned during the development of the imaging layer, this innovative technique allows for enhanced precision in the patterning process. Once the imaging layer is stripped using organic solvents, the same hardmask can be further refined using subsequent exposure-development techniques, ultimately allowing the pattern to be transferred to the substrate via etching.

Career Highlights: Hao Xu has proven himself as a key figure in the realm of lithography, particularly through his role at Brewer Science, Inc. His work has been pivotal in streamlining processes and improving the efficacy of various applications within the industry. Xu's patents not only showcase his inventiveness but also reflect his commitment to advancing technology.

Collaborations: Throughout his career, Hao Xu has collaborated with talented individuals such as Douglas J. Guerrero and Tony D. Flaim. These partnerships have been essential in fostering innovative ideas and projecting them into practical applications.

Conclusion: As an inventor, Hao Xu exemplifies the spirit of innovation through his contributions to lithography and materials science. His work continues to inspire future advancements in technology, which are crucial for the evolution of manufacturing processes. The impact of his patents and collaborations will undoubtedly resonate within the industry for years to come.