The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2012

Filed:

Oct. 30, 2008
Applicants:

Hao Xu, Rolla, MO (US);

Ramil-marcelo L. Mercado, Rolla, MO (US);

Douglas J. Guerrero, Rolla, MO (US);

Jim D. Meador, Manchester, MO (US);

Inventors:

Hao Xu, Rolla, MO (US);

Ramil-Marcelo L. Mercado, Rolla, MO (US);

Douglas J. Guerrero, Rolla, MO (US);

Jim D. Meador, Manchester, MO (US);

Assignee:

Brewer Science Inc., Rolla, MO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01); G03C 1/825 (2006.01); G03C 1/835 (2006.01);
U.S. Cl.
CPC ...
Abstract

Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).


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