The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Jul. 28, 2008
Daniel M. Sullivan, Vichy, MO (US);
Runhui Huang, Rolla, MO (US);
Charles J. Neef, Rolla, MO (US);
Jinhua Dai, Rolla, MO (US);
Michael B. Swope, Belle, MO (US);
Daniel M. Sullivan, Vichy, MO (US);
Runhui Huang, Rolla, MO (US);
Charles J. Neef, Rolla, MO (US);
Jinhua Dai, Rolla, MO (US);
Michael B. Swope, Belle, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.