Belle, MO, United States of America

Michael B Swope

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Brewer Science, Inc.. Active years: 2016.


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Michael B Swope: Innovator in Photolithography Processes

Introduction

Michael B Swope is a notable inventor based in Belle, MO (US). He has made significant contributions to the field of photolithography through his innovative work. His expertise and creativity have led to the development of advanced materials that enhance lithographic applications.

Latest Patents

Swope holds a patent for "Non-covalently crosslinkable materials for photolithography processes." This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo a change after coating that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks. He has 1 patent to his name.

Career Highlights

Michael B Swope is associated with Brewer Science, Inc., where he continues to push the boundaries of innovation in materials science. His work has been instrumental in advancing the capabilities of photolithography processes, making significant impacts in various applications.

Collaborations

Swope has collaborated with talented individuals such as Daniel M Sullivan and Runhui Huang. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Michael B Swope is a distinguished inventor whose contributions to photolithography processes have paved the way for advancements in the field. His innovative spirit and dedication to research continue to inspire future developments in materials science.

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