Freiburg, Germany

Daniel Kray

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2004-2014

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Daniel Kray

Introduction

Daniel Kray, an accomplished inventor based in Freiburg, Germany, has made significant contributions to the field of surface treatment and precision processing technologies. With a total of five patents to his name, Kray has developed groundbreaking methods and agents that enhance the quality and efficiency of wafer processing.

Latest Patents

One of Kray's most notable inventions is a "Texturing and cleaning agent for the surface treatment of wafers and use thereof." This liquid agent contains an alkaline etching component in conjunction with low-volatile organic compounds. It is designed for the surface treatment of monocrystalline wafers, allowing for cleaning, damage etching, and texturing in a single step. This innovation effectively addresses various surface qualities, whether dealing with wire-sawn wafers that exhibit high surface damage or chemically polished surfaces with minimal damage density.

Another remarkable patent is the "Method for the precision processing of substrates." This invention pertains to the precision microstructuring of thin layers, local dopant introduction, and the application of metal nucleation layers. The process utilizes liquid-assisted laser technology, where a reactive liquid covers specific areas on the substrate prior to laser irradiation, thus enhancing the precision of substrate processing.

Career Highlights

Throughout his career, Daniel Kray has been affiliated with reputable organizations, most notably the Fraunhofer Society for the Advancement of Applied Research and Innovalight, Inc. His work in these institutions has allowed him to refine his inventions and collaborate with some of the brightest minds in the industry.

Collaborations

Kray has had the opportunity to work alongside esteemed colleagues such as Kuno Mayer and Maxim Kelman. Their combined expertise has likely fostered an environment of innovation and development, propelling Kray's inventions to the forefront of modern technology.

Conclusion

Daniel Kray continues to be a leading figure in innovative wafer processing technologies. His patents not only highlight his inventive prowess but also contribute significantly to advancements in the semiconductor industry. As technology continues to evolve, Kray's work remains a testament to the impact that dedicated inventors can make in shaping the future of engineering and materials science.

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