The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Jun. 02, 2010
Kuno Mayer, Frankfurt/Main, DE;
Mark Schumann, Freiburg, DE;
Daniel Kray, Freiburg, DE;
Teresa Orellana Peres, Freiburg, DE;
Jochen Rentsch, Emmendingen, DE;
Martin Zimmer, Freiburg, DE;
Elias Kirchgässner, Freiburg, DE;
Eva Zimmer, Freiburg, DE;
Daniel Biro, Freiburg, DE;
Arpad Mihai Rostas, Freiburg, DE;
Filip Granek, Freiburg, DE;
Kuno Mayer, Frankfurt/Main, DE;
Mark Schumann, Freiburg, DE;
Daniel Kray, Freiburg, DE;
Teresa Orellana Peres, Freiburg, DE;
Jochen Rentsch, Emmendingen, DE;
Martin Zimmer, Freiburg, DE;
Elias Kirchgässner, Freiburg, DE;
Eva Zimmer, Freiburg, DE;
Daniel Biro, Freiburg, DE;
Arpad Mihai Rostas, Freiburg, DE;
Filip Granek, Freiburg, DE;
Abstract
A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusively for the texturing of silicon wafers with different surface quality, whether it now be wire-sawn wafers with high surface damage or chemically polished surfaces with minimum damage density.