This inventor holds 2 USPTO granted patents and 3 published patent applications and 2 EPO patents. Top assignee: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.. Active years: 2014.
Company Filing History:
Years Active: 2014
Title: Jochen Rentsch: Innovator in Semiconductor Technology
Introduction
Jochen Rentsch is a notable inventor based in Emmendingen, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to surface treatment and doping methods.
Latest Patents
One of his latest patents is titled "Texturing and cleaning agent for the surface treatment of wafers and use thereof." This invention involves a liquid agent designed for the surface treatment of monocrystalline wafers. It contains an alkaline etching agent and at least one low-volatile organic compound. This system can be utilized for cleaning, damage etching, and texturing wafer surfaces in a single etching step. It is effective for silicon wafers with varying surface qualities, including wire-sawn wafers with high surface damage and chemically polished surfaces with minimal damage density.
Another significant patent by Rentsch is the "Method for local contacting and local doping of a semiconductor layer." This method includes several process steps, such as generating a layer structure on the semiconductor layer. It involves applying at least one intermediate layer and a metal layer, followed by local heating to create a melt-mixture that forms a contact between the metal layer and the semiconductor layer. This innovative approach ensures that the dopant layer has a greater solubility in the semiconductor layer than the metal of the metal layer.
Career Highlights
Jochen Rentsch is associated with the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., a leading research organization in Germany. His work focuses on advancing semiconductor technologies, contributing to the development of efficient and effective methods for wafer treatment and doping.
Collaborations
Throughout his career, Rentsch has collaborated with notable colleagues, including Daniel Biro and Kuno Mayer. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Jochen Rentsch is a prominent figure in the semiconductor industry, recognized for his innovative patents and contributions to wafer technology. His work continues to influence advancements in the field, showcasing the importance of research and development in driving technological progress.
