Kuno Mayer

Title: Innovative Contributions of Inventor Kuno Mayer

Introduction

Kuno Mayer, an inventive mind based in Frankfurt/Main, Germany, has made significant contributions to the field of material processing and surface treatment technologies. With two patented inventions to his name, Mayer's work addresses important challenges in the semiconductor industry, particularly in the treatment of wafer surfaces.

Latest Patents

Kuno Mayer's latest patents reflect his commitment to advancing technology in substrate treatment. The first patent, titled "Texturing and cleaning agent for the surface treatment of wafers and use thereof," presents a novel liquid agent designed for the surface treatment of monocrystalline wafers. This innovative solution includes an alkaline etching agent and one or more low-volatile organic compounds. The technology enables effective cleaning, damage etching, and texturing of wafer surfaces in a single etching step, catering to various silicon wafer surface qualities, from wire-sawn with high surface damage to chemically polished surfaces with minimal damage density.

The second patent, "Method for the precision processing of substrates," describes a method that utilizes liquid-assisted laser processing for the microstructuring of thin layers, including local dopant introduction and application of metal nucleation layers. This process employs laser irradiation on substrates that are covered in specified regions by a reactive liquid, enhancing precision in material processing.

Career Highlights

Kuno Mayer has been associated with renowned research institutions, most notably the Fraunhofer Society for the Advancement of Applied Research e.V. and Albert-Ludwigs-University Freiburg. His tenure in these institutions has fostered an environment for innovative research, leading to the development of groundbreaking technologies in the processing of materials.

Collaborations

Throughout his career, Mayer has collaborated with esteemed colleagues such as Daniel Kray and Mark Schumann. These partnerships have enriched his research endeavors and contributed to the collaborative spirit often essential in advancing technological innovations.

Conclusion

Kuno Mayer stands out as a prominent inventor whose patents play a crucial role in surface treatment technologies for semiconductors. With a strategic focus on enhancing the precision and quality of wafer processing, Mayer's work is pivotal to the ongoing progression of materials science and engineering. His contributions not only pave the way for new technical advancements but also serve as an inspiration for future inventors in the field.