Otsu, Japan

Daisuke Sakii


 

Average Co-Inventor Count = 3.0

ph-index = 1


Location History:

  • Shiga, JP (2020)
  • Otsu, JP (2021 - 2023)

Company Filing History:


Years Active: 2020-2023

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3 patents (USPTO):Explore Patents

Title: Daisuke Sakii: Innovator in Semiconductor Technology

Introduction

Daisuke Sakii is a prominent inventor based in Otsu, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of field-effect transistors and photosensitive resin compositions. With a total of 3 patents to his name, Sakii continues to push the boundaries of innovation in his field.

Latest Patents

Sakii's latest patents include a field-effect transistor that features a substrate, source electrode, drain electrode, gate electrode, and a semiconductor layer containing carbon nanotubes. This invention aims to reduce leak current and allows for a uniform application of semiconductor solutions. Another notable patent is a negative-type photosensitive resin composition that is highly sensitive and capable of forming low-taper pattern shapes. This composition includes an alkali-soluble resin, a radical polymerizable compound, and a photo initiator, ensuring excellent heat resistance in the resulting cured film.

Career Highlights

Daisuke Sakii is currently employed at Toray Industries, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of electronic devices and materials. His innovative approach has garnered attention in the industry, making him a respected figure among his peers.

Collaborations

Sakii has collaborated with notable coworkers such as Seiichiro Murase and Junji Wakita. These partnerships have contributed to the successful development of his patents and have fostered a collaborative environment for innovation.

Conclusion

Daisuke Sakii is a key player in the field of semiconductor technology, with a focus on developing advanced materials and devices. His contributions through his patents reflect his commitment to innovation and excellence in his work.

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