The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2023

Filed:

Sep. 25, 2018
Applicant:

Toray Industries, Inc., Tokyo, JP;

Inventors:

Daisuke Sakii, Otsu, JP;

Seiichiro Murase, Otsu, JP;

Junji Wakita, Otsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 10/46 (2023.01); C08K 3/04 (2006.01); C08K 3/08 (2006.01); C08K 3/22 (2006.01); G06K 19/07 (2006.01); C08G 77/00 (2006.01); C08G 77/22 (2006.01); H01L 29/786 (2006.01); C08G 77/28 (2006.01); C08G 77/14 (2006.01);
U.S. Cl.
CPC ...
H10K 10/478 (2023.02); C08G 77/22 (2013.01); C08G 77/28 (2013.01); C08G 77/80 (2013.01); C08K 3/041 (2017.05); C08K 3/08 (2013.01); C08K 3/22 (2013.01); G06K 19/0723 (2013.01); H01L 29/78696 (2013.01); C08G 77/14 (2013.01); C08K 2003/0806 (2013.01); C08K 2003/2237 (2013.01); C08K 2201/011 (2013.01);
Abstract

A field-effect transistor including at least: a substrate; a source electrode; a drain electrode; a gate electrode; a semiconductor layer in contact with the source electrode and with the drain electrode; and a gate insulating layer insulating between the semiconductor layer and the gate electrode, wherein the semiconductor layer contains a carbon nanotube, and the gate insulating layer contains a polymer having inorganic particles bound thereto. Provided is a field-effect transistor and a method for producing the field-effect transistor, wherein the field-effect transistor causes decreased leak current and furthermore enables a semiconductor solution to be uniformly applied.


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