Company Filing History:
Years Active: 2014-2024
Title: Daisuke Ishimaru: Innovator in Substrate Processing Technology
Introduction
Daisuke Ishimaru is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate processing technology. With a remarkable portfolio comprising eight patents, Ishimaru has made a substantial impact in his field, particularly within his role at Tokyo Electron Limited.
Latest Patents
Among his latest innovations, Daisuke Ishimaru has developed a substrate processing apparatus that includes a discharge part equipped with a nozzle for discharging processing liquid onto a substrate. The apparatus features a liquid feeder for feeding the processing liquid, along with a replenishment part designed to keep the liquid feeder supplied. A connector with a switching valve controls the flow path between the replenishment part and the liquid feeder. Additionally, a filter ensures the purity of the processing liquid by removing foreign matters. The replenishment system is engineered to open the switching valve after balancing pressure differences, enabling efficient liquid replenishment.
Another notable patent encompasses a hollow tube body utilized in liquid feeding, which can be deformed under pressurization. The tube's axial cross-section consists of two long and two short side parts, with uniquely designed corner portions that curve outward. The recessed areas along the long sides and the flat portions on the short sides give this invention a distinct structural integrity for effective performance in various applications.
Career Highlights
Daisuke Ishimaru has made waves in the semiconductor industry through his innovative designs and engineering. His dedication to advancing substrate processing technology at Tokyo Electron Limited has positioned him as a leading figure in his area of expertise. With numerous patents to his name, he continues to push the boundaries of what is possible in his field.
Collaborations
Collaboration is crucial in the innovative process, and Ishimaru has worked closely with talented colleagues such as Takashi Sasa and Kousuke Yoshihara. Their combined efforts and shared vision have enhanced the potential for groundbreaking advancements within Tokyo Electron Limited.
Conclusion
Daisuke Ishimaru's contributions to substrate processing technology illustrate his prowess as an inventor. With his extensive patent portfolio and collaborative spirit, he remains a vital force in his domain, inspiring future innovations that may shape the industry for years to come.