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For the Inventor, By the Inventor

Suwa, Japan

Daisuke Abe

This inventor holds 11 USPTO granted patents. Top assignee: Seiko Epson Corporation. Active years: 2004-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Abe. Retrieved from https://idiyas.com/inventor/daisuke-abe-w3w79mu7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 81.8

Average Co-Inventor Count = 1.3

ph-index = 3

Forward Citations = 68(Granted Patents)


Location History:

  • Suwa, JP (2004 - 2010)
  • Chino, JP (2010 - 2016)

Company Filing History:

goldMedal11 out of 34,296 
 
Seiko Epson Corporation
 patents

Years Active: 2004-2016

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11 patents (USPTO):Explore Patents
1. 9470948 - Electrophoretic display base having porous lid (2016-10-18),
2. 9310662 - Electrophoretic display apparatus and electronic device having a boundary layer between an electrode and an electrophoretic layer (2016-04-12),
3. 9244325 - Display sheet, method for producing display sheet, display apparatus, and electronic device (2016-01-26),
4. 8754843 - Electrophoretic device, method for driving same, and electronic apparatus (2014-06-17),
5. 7781964 - Organic electroluminescent device and electronic apparatus (2010-08-24),
6. 7763899 - Electro-optical device and electronic apparatus having a plurality of pixel sections disposed in a staggered manner (2010-07-27),
7. 7649669 - Display device (2010-01-19),
8. 7393724 - Reduced dielectric breakdown/leakage semiconductor device and a method of manufacturing the same, integrated circuit, electro-optical device, and electric apparatus (2008-07-01),
9. 7384827 - Method of manufacturing semiconductor device using liquid phase deposition of an interlayer dielectric (2008-06-10),
10. 6905920 - Method for fabrication of field-effect transistor to reduce defects at MOS interfaces formed at low temperature (2005-06-14),
11. 6825069 - System and method for fabricating a transistor by a low temperature heat treatment process (2004-11-30),

Title: Daisuke Abe: Innovator in Electrophoretic Display Technology

Introduction

Daisuke Abe is a prominent inventor based in Suwa, Japan. He has made significant contributions to the field of electrophoretic display technology. With a total of 11 patents to his name, Abe continues to push the boundaries of innovation in this area.

Latest Patents

Abe's latest patents include groundbreaking inventions such as an electrophoretic display base having a porous lid. This invention features a base with a partition that allows an electrophoretic dispersion liquid to pass through, enhancing the functionality of display technology. Another notable patent is the electrophoretic display apparatus and electronic device that incorporates a boundary layer between an electrode and an electrophoretic layer. This design optimizes the performance of the display by ensuring that specific resistivity and thickness parameters are met.

Career Highlights

Daisuke Abe is currently employed at Seiko Epson Corporation, where he applies his expertise in developing advanced display technologies. His work has been instrumental in advancing the capabilities of electrophoretic displays, making them more efficient and effective for various applications.

Collaborations

Abe has collaborated with notable colleagues such as Hiroyuki Hara and Sumio Utsunomiya. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Daisuke Abe's contributions to electrophoretic display technology exemplify his commitment to innovation. His patents and collaborations highlight his role as a leading inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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