Da-Zhi Zhang

Title: Da-Zhi Zhang: Innovator in Semiconductor Technology

Introduction

Da-Zhi Zhang is a talented inventor based in Taipei, Taiwan. She has made significant contributions to the field of semiconductor technology. Although she currently holds no granted patents, her innovative ideas are reflected in her latest patent applications.

Latest Patent Applications

One of her recent applications is titled "SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME." This application describes semiconductor structures and methods for manufacturing them. The method includes nanostructures formed over a substrate, along with a gate structure formed on the nanostructures. The semiconductor structure features a source/drain (S/D) structure adjacent to the gate structure, and a contact structure that is partially embedded in the S/D structure, featuring a T-shaped design.

Another notable application is "SEMICONDUCTOR DEVICE STRUCTURE WITH ISOLATION LAYER AND METHOD FOR FORMING THE SAME." This method involves providing a substrate with a base, a first fin, and a second fin over the base. It includes forming a first trench in the base between the fins and creating an isolation layer over the base and in the trench. The method also describes the formation of gate stacks over the fins and the removal of a bottom portion of the base, allowing the isolation layer to pass through after the removal.

Conclusion

Da-Zhi Zhang is an innovative inventor whose work in semiconductor technology showcases her potential in the field. Her latest patent applications reflect her commitment to advancing semiconductor structures and methods.