Clackamas, OR, United States of America

Colin D Yates


Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 317(Granted Patents)


Location History:

  • San Jose, CA (US) (1999 - 2004)
  • Clackamas, OR (US) (2006 - 2013)

Company Filing History:


Years Active: 1999-2013

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10 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Colin D Yates

Introduction

Colin D Yates is a notable inventor based in Clackamas, Oregon. He has made significant contributions to the field of nanotechnology, holding a total of 10 patents. His work primarily focuses on methods for aligning nanotubes and wires, which are crucial for advancements in various technological applications.

Latest Patents

Among his latest patents, one is titled "Method of aligning nanotubes and wires with an etched feature." This patent discloses a method for forming an aligned connection between a nanotube layer and an etched feature. The process involves creating an etched feature with a top and a side, and optionally a notched feature at the top. A patterned nanotube layer is then formed to contact portions of the side and overlap a portion of the top of the etched feature. Following this, the nanotube layer is covered with an insulating layer, and a top portion of the insulating layer is removed to expose a top portion of the etched feature.

Another significant patent is "Method of aligning deposited nanotubes onto an etched feature using a spacer." This method describes forming an aligned connection between a nanotube layer and a raised feature. The process includes a substrate with a raised feature, where spacers are formed next to the side of the raised feature. The spacers are etched until the sidewalls of the raised feature are exposed, creating a notched feature at the top of the spacers. A patterned nanotube layer is then formed to overlie the top of the spacer and contact a side portion of the raised feature in the notched feature. Similar to the previous method, the nanotube layer is covered with an insulating layer, and a top portion of the insulating layer is removed to expose a top portion of the etched feature.

Career Highlights

Colin D Yates has worked with prominent companies in the technology sector, including LSI Logic Corporation and Nantero, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in nanotechnology.

Collaborations

Colin has collaborated with notable individuals in his field, including Nicholas F Pasch and Nicholas K Eib. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Colin D Yates is a distinguished inventor whose work in nanotechnology has led to significant advancements in

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