The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
May. 29, 2009
Colin D. Yates, Clackamas, OR (US);
Christopher L. Neville, Portland, OR (US);
Thomas Rueckes, Rockport, MA (US);
Steven L. Konsek, Boston, MA (US);
Mitchell Meinhold, Arlington, MA (US);
Claude L. Bertin, Venice, FL (US);
Colin D. Yates, Clackamas, OR (US);
Christopher L. Neville, Portland, OR (US);
Thomas Rueckes, Rockport, MA (US);
Steven L. Konsek, Boston, MA (US);
Mitchell Meinhold, Arlington, MA (US);
Claude L. Bertin, Venice, FL (US);
Nantero, Inc., Woburn, MA (US);
Abstract
A method of forming an aligned connection between a nanotube layer and a raised feature is disclosed. A substrate having a raised feature has spacers formed next to the side of the raised feature. The spacers are etched until the sidewalls of the raised feature are exposed forming a notched feature at the top of the spacers. A patterned nanotube layer is formed such that the nanotube layer overlies the top of the spacer and contacts a side portion of the raised feature in the notched feature. The nanotube layer is then covered with an insulating layer. Then a top portion of the insulating layer is removed to expose a top portion of the etched feature.