Eindhoven, Netherlands

Clementius Andreas Johannes Beijers

This inventor holds 4 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2011-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clementius Andreas Johannes Beijers. Retrieved from https://idiyas.com/inventor/clementius-andreas-johannes-beijers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.4

ph-index = 3

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2011-2016

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4 patents (USPTO):Explore Patents

Title: The Innovative Journey of Clementius Andreas Johannes Beijers

Introduction:

Clementius Andreas Johannes Beijers, a visionary inventor based in Eindhoven, NL, stands as a testament to the power of innovation and perseverance. His relentless pursuit of excellence and commitment to creating a better future through inventions continue to inspire generations of inventors and innovators worldwide.

Latest Patents:

Among his notable contributions are his latest patents, which include a "Lithographic apparatus with actuator to compensate acoustic vibration" and a "Lithographic apparatus and device manufacturing method." These inventions showcase Beijers' ingenuity and expertise in the field of lithography.

Career Highlights:

Beijers has successfully secured a total of 4 patents throughout his career, demonstrating his proficiency in developing cutting-edge technological solutions. His work at ASML Netherlands B.V. has been instrumental in advancing the field of lithography and semiconductor manufacturing.

Collaborations:

Throughout his career, Beijers has collaborated with esteemed colleagues such as Johan Hendrik Geerke and Hans Butler. Together, they have worked on innovative projects that have furthered the boundaries of technological advancement.

Conclusion:

In conclusion, Clementius Andreas Johannes Beijers' dedication to innovation and his remarkable contributions to the field of lithography serve as an inspiration to aspiring inventors worldwide. His inventive spirit and unwavering commitment to excellence continue to leave a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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