This inventor holds 4 USPTO granted patents. Top assignees: Centre National De La Recherche Scientifique, Sandia Corporation, California Institute of Technology. Active years: 1989-2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Eybens, FR (1989)
- Brie et Angonnes, FR (1999 - 2001)
Company Filing History:
2 out of 5,383 
2 out of 1,769 
1 out of 4,626 
Years Active: 1989-2001
Title: Claude Bernard: Innovator in Chemical Vapor Deposition
Introduction
Claude Bernard is a notable inventor hailing from Brie et Angonnes, France. He has made significant contributions to the field of chemical vapor deposition, holding a total of 4 patents. His innovative methods have advanced the technology used in coating materials, showcasing his expertise and dedication to research.
Latest Patents
Bernard's latest patents include a Non-plasma CVD method and apparatus for forming Ti1-xA1xN coatings. This method allows for the formation of a Ti,Al,N coating on a part without plasma enhancement. The process involves heating a chemical vapor deposition chamber to temperatures between 250-500°C, while the part to be coated is heated to 550-650°C. A mixture of titanium and aluminum chlorides, ammonia, and hydrogen is injected into the chamber, with specific molar ratios to ensure optimal coating quality.
Another significant patent is the synthesis of W-Si-N films by chemical vapor deposition using WF6. This invention relates to forming amorphous or near-amorphous, ternary films of W-Si-N on substrates. The method allows for conformal coating on patterned non-planar substrates at temperatures at or below about 450°C. The reactor pressure can be varied between 0.1 to 50 Torr, and the composition of the deposited films can be adjusted by varying the flow ratios of the reactive gases.
Career Highlights
Throughout his career, Claude Bernard has worked with esteemed organizations such as the Centre National de la Recherche Scientifique and Sandia Corporation. His work in these institutions has contributed to his reputation as a leading figure in the field of chemical vapor deposition.
Collaborations
Bernard has collaborated with notable individuals in his field, including Roland Madar and Elizabeth Lynn Roherty-Osmun. These partnerships have further enriched his research and innovations.
Conclusion
Claude Bernard's contributions to chemical vapor deposition and his innovative patents have made a lasting impact on the industry. His work continues to influence advancements in material coatings and deposition techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile