The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1999
Filed:
Oct. 01, 1996
Applicant:
Inventors:
James G Fleming, Albuquerque, NM (US);
Elizabeth Lynn Roherty-Osmun, Albuquerque, NM (US);
Paul M Smith, Albuquerque, NM (US);
Jonathan S Custer, Albuquerque, NM (US);
Ronald V Jones, Albuquerque, NM (US);
Marc-A Nicolet, Pasadena, CA (US);
Roland Madar, Eybens, FR;
Claude Bernard, Brie et Angonnes, FR;
Assignee:
Sandia Corporation, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
4272552 ; 427255 ; 4272551 ;
Abstract
A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF.sub.6, either silicon or boron, and nitrogen. The result is a W--Si--N or W--B--N thin film useful for diffusion barrier and micromachining applications.