This inventor holds 2 USPTO granted patents. Top assignees: Sandia Corporation, California Institute of Technology. Active years: 1999.
Company Filing History:
2 out of 1,769 
1 out of 4,624 
Years Active: 1999
Title: The Innovations of Ronald V. Jones
Introduction
Ronald V. Jones is a notable inventor based in Albuquerque, NM. He has made significant contributions to the field of chemical vapor deposition, particularly in the synthesis of tungsten-silicon-nitrogen (W-Si-N) films. With a total of 2 patents, his work has implications for various technological applications.
Latest Patents
One of his latest patents is titled "Synthesis of W-Si-N films by chemical vapor deposition using WF.sub.6." This invention relates to the formation of amorphous or near-amorphous, ternary films of W-Si-N on substrates. The method allows for conformal forming of these films on patterned non-planar substrates at temperatures at or below about 450°C. The typical temperature range for the formation of the films is between 473 K and 773 K, with reactor pressure varying between 0.1 to 50 Torr. The composition of the deposited films can be adjusted by varying the flow ratios of the reactive gases.
Another significant patent by Jones is "Chemical vapor deposition of W-Si-N and W-B-N." This method involves depositing a ternary, refractory-based thin film on a substrate using precursor sources of tungsten, silicon, or boron, and nitrogen. The resulting W-Si-N or W-B-N thin films are useful for diffusion barrier and micromachining applications.
Career Highlights
Throughout his career, Ronald V. Jones has worked with prominent organizations such as Sandia Corporation and the California Institute of Technology. His experience in these institutions has contributed to his expertise in the field of chemical vapor deposition.
Collaborations
Jones has collaborated with notable individuals in his field, including Jonathan S. Custer and Claude Bernard. These collaborations have likely enriched his research and development efforts.
Conclusion
Ronald V. Jones is a distinguished inventor whose work in chemical vapor deposition has led to valuable patents and advancements in technology. His contributions continue to influence the field and inspire future innovations.