This inventor holds 2 USPTO granted patents. Top assignees: Sandia Corporation, California Institute of Technology. Active years: 1999.
Company Filing History:
2 out of 1,769 
1 out of 4,622 
Years Active: 1999
Title: Innovations of Jonathan S. Custer
Introduction
Jonathan S. Custer is an accomplished inventor based in Albuquerque, NM. He holds a total of 2 patents that showcase his expertise in chemical vapor deposition technologies. His work has significantly contributed to advancements in the field of materials science.
Latest Patents
Custer's latest patents include the "Synthesis of W-Si-N films by chemical vapor deposition using WF.sub.6." This invention relates to the formation of amorphous or near-amorphous, ternary films of W-Si-N on substrates. The method allows for conformal forming of these films on patterned non-planar substrates at temperatures at or below about 450°C. The typical temperature range for the formation of the films is between 473 K and 773 K, with reactor pressure varying between 0.1 to 50 Torr. The composition of the deposited films can be adjusted by varying the flow ratios of the reactive gases. Another notable patent is the "Chemical vapor deposition of W-Si-N and W-B-N." This method involves depositing a ternary, refractory-based thin film on a substrate using precursor sources of tungsten, silicon or boron, and nitrogen. The resulting W-Si-N or W-B-N thin film is useful for diffusion barrier and micromachining applications.
Career Highlights
Throughout his career, Custer has worked with prominent organizations such as Sandia Corporation and the California Institute of Technology. His contributions to these institutions have furthered research and development in innovative technologies.
Collaborations
Custer has collaborated with notable colleagues, including James G. Fleming and Roland Madar. These partnerships have enhanced the scope and impact of his research endeavors.
Conclusion
Jonathan S. Custer's work in the field of chemical vapor deposition has led to significant innovations that are valuable in various applications. His patents reflect his commitment to advancing technology and materials science.