The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2001
Filed:
Feb. 02, 1999
Applicant:
Inventors:
Roland Madar, Eybens, FR;
Alain Rouault, Poisat, FR;
Elisabeth Blanquet, Grenoble, FR;
Claude Bernard, Brie et Angonnes, FR;
Anne-Marie Dutron, Grenoble, FR;
Assignee:
Centre National de la Recherche Scientifique, Paris, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/608 ;
U.S. Cl.
CPC ...
C23C 1/608 ;
Abstract
A method for forming a Ti,Al,N coating on a part without plasma enhancement, wherein a chemical vapor deposition chamber is heated to 250-500° C.; the part to be coated is heated to 550-650° C. and placed in said chamber; and a mixture of titanium and aluminium chlorides, NH,and H,is injected into the chamber. The molar amount of NH,is greater than the molar amount of chlorides, and the molar amount of hydrogen is over five times greater than the molar amount of chlorides.