Company Filing History:
Years Active: 1998-2016
Title: Chyu Jiuh Torng: Innovator in Magnetic Tunnel Junction Technology
Introduction
Chyu Jiuh Torng is a prominent inventor based in Pleasanton, CA (US). He holds a total of 12 patents that showcase his contributions to the field of magnetic tunnel junctions (MTJs) for MRAM applications. His innovative work has significantly advanced the performance and efficiency of memory technologies.
Latest Patents
One of his latest patents involves a magnetic tunnel junction designed for MRAM applications. This invention features a composite free layer that includes a lower crystalline layer in contact with a tunnel barrier and an upper amorphous layer. The configuration aims to enhance bit switching performance. In one embodiment, the amorphous layer consists of a NiFeM/NiFeM structure, where the elements M and M1 are selected from Mg, Hf, Zr, Nb, or Ta, with M1 being unequal to M2. The crystalline layer is composed of Fe, Ni, or FeB, with a thickness of at least 6 Angstroms, which provides a high magnetoresistive ratio. The specific composition of the NiFeM and NiFeM layers is designed to reduce bit line switching current and the number of shorted bits. Additionally, annealing at temperatures between 300°C to 360°C results in a magnetoresistive ratio of approximately 150%.
Career Highlights
Chyu Jiuh Torng has worked with notable companies in the technology sector, including Headway Technologies, Incorporated and Read Rite Corporation. His experience in these organizations has allowed him to refine his expertise in magnetic technologies and contribute to significant advancements in the field.
Collaborations
Some of his notable coworkers include Cheng Tzong Horng and Cherng-Chyi Han, who have collaborated with him on various projects related to magnetic tunnel junctions.
Conclusion
Chyu Jiuh Torng's innovative work in magnetic tunnel junction technology has made a lasting impact on the field of memory applications. His patents reflect a commitment to enhancing performance and efficiency in MRAM technologies.