Taipei, Taiwan

Chung-Pei Wang

This inventor holds 25 USPTO granted patents, primarily in Sputtering Technology. Top assignees: Hon Hai Precision Industry Co., Ltd., Miics & Partners (Shenzhen) Co., Ltd.. Active years: 2010-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Pei Wang. Retrieved from https://idiyas.com/inventor/chung-pei-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 4.0

Average Co-Inventor Count = 1.2

ph-index = 2

Forward Citations = 21(Granted Patents)


Location History:

  • Taipei Hsien, TW (2010 - 2013)
  • Tucheng, TW (2011 - 2013)
  • New Taipei, TW (2015 - 2019)

Company Filing History:


Years Active: 2010-2019

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Areas of Expertise:
Sputtering Device
Coating Method
Infrared-Cut Filter
Chemically Strengthened Glass
Vacuum Deposition
Lens Module
Film Coating
Pattern Formation
Carrier Apparatus
Inspection Device
Multilayer Substrate
Gas Inputting Device
25 patents (USPTO):Explore Patents

Title: Innovations of Chung-Pei Wang: Advancements in Glass Cutting and Sputtering Technology

Introduction: Chung-Pei Wang, an accomplished inventor based in Taipei Hsien, Taiwan, has made significant contributions to the fields of glass cutting and sputtering technology. With an impressive portfolio of 25 patents, he continues to push the boundaries of innovation. His latest patents showcase his expertise and creative approach to problem-solving in industrial applications.

Latest Patents: Among his most recent innovations is the "Method for Cutting Glass." This patent describes a process where a glass substrate, featuring at least one cutting surface with micro-fractures, is enhanced by a conductive material layer. This layer, which absorbs laser energy, is irradiated by a laser to repair the micro-fractures, improving the cutting precision and quality. Another notable patent is for a "Sputtering Device," where the innovative design includes a carrier with a main body defining a receiving space and grooves for workpieces. The support members are designed to be selectively and movably retained, optimizing the sputtering process for various applications.

Career Highlights: Chung-Pei Wang has garnered experience by working with reputable companies such as Hon Hai Precision Industry Co., Ltd. and Miics & Partners (Shenzhen) Co., Ltd. His tenure at these organizations has allowed him to refine his skills and contribute to cutting-edge technological developments.

Collaborations: Throughout his career, Chung-Pei has collaborated with other prominent professionals in the field, including Feng-Yuen Dai and Hung-Lien Yeh. These partnerships have fostered a collaborative environment that promotes innovation and enhances research efforts in their respective areas of expertise.

Conclusion: Chung-Pei Wang's commitment to innovation in glass cutting and sputtering technology marks him as a notable figure in the industry. His inventive solutions not only advance manufacturing processes but also reflect the potential for future developments in these fields. With his continued contributions and collaborative efforts, Chung-Pei Wang remains a key player in driving technological innovation forward.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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